Reversal of strain state in a Mott insulator thin film by controlling substrate morphologyReetendra Singh, Abhishek Rakshit, Galit Atiya, Michael Kalina, Yaron Kauffmann, Yoav Kalcheimhttps://arxiv.org/abs/2510.02234
Reversal of strain state in a Mott insulator thin film by controlling substrate morphologyThe V2O3 phase diagram contains two insulating phases and one metallic phase with different lattice structures. The stability of these phases is very sensitive to pressure, offering a mechanism to tune phase transitions by inducing strain in thin films. The most studied source of strain is lattice mismatch between the film and the substrate. In this work, however, we find that the film/substrate thermal expansion mismatch can be made to play a dominant role by modifying the substrate morphology…