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Implantation studies of low-energy positive muons in niobium thin films
Ryan M. L. McFadden, Andreas Suter, Leon Ruf, Angelo Di Bernardo, Arnold M. M\"uller, Thomas Prokscha, Zaher Salman, Tobias Junginger
https://arxiv.org/abs/2507.03785

Implantation studies of low-energy positive muons in niobium thin films
Here we study the range of keV positive muons $μ^+$ implanted in Nb$_2$O$_5$($x$ nm)/Nb($y$ nm)/SiO$_2$(300 nm)/Si [$x$ = 3.6 nm, 3.3 nm; $y$ = 42.0 nm, 60.1 nm] thin films using low-energy muon spin spectroscopy (LE-$μ$SR). At implantation energies 1.3 keV $\leq E \leq$ 23.3 keV, we compare the measured diamagnetic $μ^+$ signal fraction $f_{\mathrm{dia.}}$ against predictions derived from implantation profile simulations using the TRIM.SP Monte Carlo code. Treating the implanted $μ^+$ as l…