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@azonenberg@ioc.exchange
2025-10-18 22:29:07

For some reason the combination of 160K and my Mitutoyo 100x/0.90 objective means that as the last bits of ILD begin to etch away, substrate features become *less* visible.
I expected to see strong contrast at edges of substrate features when the ILD was etched away despite poly, STI trenches, and diffusion areas all being the same material (silicon).
But that's not what I'm seeing.
Going back to my archives, though, most of my good full die 100x shots are with the …

90nm TSMC, ST STM32L431, random logic area at substrate with Olympus 100x objective showing clear contrast in fine features
Random area of Micron MT40A2G4WE at substrate with clear diffusion/STI areas visible
Montage M88DDR4DB02 showing clearly visible STI
PIC12F683 with Mitutoyo 100x objective showing poly clearly visible against substrate but almost no contrast between diffusion regions and STI
@arXiv_hepph_bot@mastoxiv.page
2025-09-19 09:28:51

Fine-grained dark matter substructure and axion haloscopes
Ciaran A. J. O'Hare, Giovanni Pierobon
arxiv.org/abs/2509.14874 arxiv.org/pd…

@arXiv_quantph_bot@mastoxiv.page
2025-09-19 10:16:01

Proposal of cavity quantum acoustodynamics platform based on Lithium Niobate-on-Sapphire chip
Xin-Biao Xu, Lintao Xiao, Bo Zhang, Weiting Wang, Jia-Qi Wang, Yu Zeng, Yuan-Hao Yang, Bao-Zhen Wang, Xiaoxuan Pan, Guang-Can Guo, Luyan Sun, Chang-Ling Zou
arxiv.org/abs/2509.14728

@azonenberg@ioc.exchange
2025-10-18 04:41:06

PIC12F683 just has a few traces of dielectric and a few vias left before it's fully stripped to substrate.
Surprisingly, poly still seems fully intact. I'm not sure if any of my cleaning steps at the end will remove it, but it's quite firmly stuck down and I haven't seen *any* of it floating free yet. Some of the tungsten contacts have come off, which doesn't surprise me at all.
Now that all the oxide over the poly is gone the poly images are even sharper, alt…

SRAM address decode circuitry showing poly and oxide over substrate, with colorful interference fringes in incompletely etched areas
Random logic with slightly blurred contacts and very clearly focused poly/active regions
@arXiv_condmatquantgas_bot@mastoxiv.page
2025-09-19 08:59:01

Zero-energy resonances in ultracold hydrogen sticking to liquid helium films of finite thickness
R. Karahanyan, A. Voronin, V. Nesvizhevsky, A. Semakin, S. Vasiliev
arxiv.org/abs/2509.14652

@azonenberg@ioc.exchange
2025-10-19 03:34:51

PIC12F683 poly/substrate with some residual contacts (some floated away, some sitting at random positions, some still firmly attached) but almost all oxide etched.
Doing the whole die at this state, then will probably do a clean to get all the loose contacts and debris off, another imaging pass.
Then I'm not sure if it's worth the effort to try for a clean substrate image given the poor contrast I'm seeing, vs just calling this the final form. We'll see what happe…

Polysilicon on the PIC12F683, almost colorless since most oxide is now etched off
@azonenberg@ioc.exchange
2025-10-19 17:32:10

And now that I'm below poly, I think it's time to give my microscope a well-deserved break from the near-constant imaging it's been doing the past few weeks.
369963 photos totaling 203.4 GB. Over a hundred hours of imaging time averaging around 3000 photos an hour. 27 etch cycles, 72 imaging runs.
I'll start shooting some analysis video later today talking about the device floorplan and such. But as a teaser, here's the final image just after stripping poly bu…

Closeup of PIC12F683 showing black shadows between diffusion regions where poly had been
Full die overview of PIC12F683 with at substrate with traces of ILD still visible in some analog areas
@arXiv_hepph_bot@mastoxiv.page
2025-09-19 09:54:41

Multiplicity Distributions and the Frontier between Soft and Hard Physics
H. R. Martins-Fontes, F. S. Navarra
arxiv.org/abs/2509.15056 arxi…

@arXiv_hepph_bot@mastoxiv.page
2025-09-19 09:37:21

Gluon Polarimetry with Energy-Energy Correlators
Yu-Kun Song, Shu-Yi Wei, Lei Yang, Jian Zhou
arxiv.org/abs/2509.14960 arxiv.org/pdf/2509.1…

@azonenberg@ioc.exchange
2025-10-17 20:54:43

And another couple of etch cycles on the PIC12F683 done.
On the home stretch, I've almost got the last of the dielectric off. But I don't want to be too aggressive because ideally I'd get a beauty shot of intact poly across the whole die first, *then* undercut the poly and get a substrate image.
So I'm still doing my usual 2 minutes etch, then image routine. It'll take as long as it takes.