Tootfinder

Substrate$-$bias driven Sputter deposited $\beta-$phase dominated Tungsten film for Spintronic applications
Abhay Singh Rajawat, Naim Ahmad, Risvana Nasril, Tasneem Sheikh, Mohammad Muhiuddin, A kumar, Mohammad R Rahman, Waseem Akhtar
https://arxiv.org/abs/2406.09749

Substrate$-$bias driven Sputter deposited $β-$phase dominated Tungsten film for Spintronic applications
$β$-Tungsten ($β$-W), a A15 cubic phase of Tungsten exhibits giant spin hall angle as compared to its bcc-phase $α$-Tungsten ($α$-W), making high quality $β$-W film desirable for spin-based application. We report on the substrate bias driven on-demand growth of $β$-W film on SiO$_2$ coated silicon (SiO$_2$/Si) using DC sputtering. GIXRD plots and SEM images are used to show a systematic change on the structure and grain size of the deposited films with the application of substrate bias. I…